1000吨三氟化氮项⽬（特⽓⾏业纯度99.996%)

Nitrogen Trifluoride），化学式NF3，是⼀种强氧化剂。作为⼀种重要的⼯业特种⽓体，具有⼴泛的应⽤领域。
在微电⼦⼯业中, 三氟化氮是⼀种优良的等离⼦蚀刻⽓体, 在半导体芯⽚, 平板显⽰器, 光纤, 光伏电池等制造领域, 三氟化氮主要⽤作等离⼦蚀刻⽓体和反应腔清洗剂. 它还可以⽤于⾼能化学激光器, 通过与氢反应在瞬间放出⼤量热来实现其应⽤. 三氟化氮还可⽤作⾼能燃料, 并且.

Nitrogen trifluoride, formula chemica NF3, est agens oxidizing fortis. Ut maximus gas industrialis specialis, amplis applicationibus habet.
In microelectronics industria, nitrogen trifluoride optimum est gas- plasma engraving; In chip semiconductor, -at tabula ostentationis, optica ber, cellulae photovoltaicae et aliae fibulae, nitrogenium trifluoride maxime adhibetur ut plasma etching gas et reactionem cavitatis purgationis agentis.
Adhiberi etiam potest in summo industria chemicae lasers, ut eius applicationis reflectatur cum hydrogenio, ut magnam vim caloris in instanti emittat. NITROGENIUM trifluoride etiam ut cibus summus industria et ut oxidizer et propellens in erucae immittit.